Tungsten disilicide

Tungsten disilicide[1] Names

IUPAC name

Tungsten disilicide

Identifiers

CAS Number

* 12039-88-2 Y

3D model (JSmol)

* Interactive image

ChemSpider |

* 7970519

EC Number |

* 234-909-0

PubChem CID

* 16212546

InChI

* InChI=1S/2Si.W

Key: WQJQOUPTWCFRMM-UHFFFAOYSA-N

SMILES

* [Si]#[W]#[Si]

Properties

Chemical formula

| WSi2
Molar mass | 240.011 g/mol
Appearance  | blue-gray tetragonal crystals
Density | 9.3 g/cm3
Melting point |  2,160 °C (3,920 °F; 2,430 K)

Solubility in water

| insoluble
Hazards
NFPA 704 (fire diamond)  |

Flash point | Non-flammable
Related compounds

Other anions

| Tungsten carbide
Tungsten nitride

Other cations

| Molybdenum disilicide

Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).

N verify (what is YN ?)
Infobox references

Tungsten disilicide (WSi2) is an inorganic compound, a silicide of tungsten. It is an electrically conductive ceramic material.

## Chemistry

Tungsten disilicide can react violently with substances such as strong acids, fluorine, oxidizers, and interhalogens.

## Applications

It is used in microelectronics as a contact material, with resistivity 60–80 μΩ cm; it forms at 1000 °C. It is often used as a shunt over polysilicon lines to increase their conductivity and increase signal speed. Tungsten disilicide layers can be prepared by chemical vapor deposition, e.g. using monosilane or dichlorosilane with tungsten hexafluoride as source gases. The deposited film is non-stoichiometric, and requires annealing to convert to more conductive stoichiometric form. Tungsten disilicide is a replacement for earlier tungsten films.[2] Tungsten disilicide is also used as a barrier layer between silicon and other metals, e.g. tungsten.

Tungsten disilicide is also of value towards use in microelectromechanical systems, where it is mostly applied as thin films for fabrication of microscale circuits. For such purposes, films of tungsten disilicide can be plasma-etched using e.g. nitrogen trifluoride gas.

WSi2 performs well in applications as oxidation-resistant coatings. In particular, in similarity to molybdenum disilicide, MoSi2, the high emissivity of tungsten disilicide makes this material attractive for high temperature radiative cooling, with implications in heat shields.[3]

## References

1. ↑ Lide, David R. (1998), Handbook of Chemistry and Physics (87 ed.), Boca Raton, FL: CRC Press, pp. 4–91, ISBN 0-8493-0594-2
2. ↑ "CVD Products - Materials". http://www.genus.com/cvd/cvd_materials.html.
3. ↑ High emissivity coatings on fibrous ceramics for reusable space systems Corrosion Science 2019

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Tungsten compounds

Tungsten(0)|

* W(CO)6

Tungsten(II)|

* WSi2
* WCl2
* W(OH)2

Tungsten(III)|

* W2O3

Tungsten(IV)|

* WC
* WO2
* WS2
* WSe2
* WTe2
* WF4
* WCl4

Tungsten(V)|

* W2O5
* WBr5
* W2Cl10

Tungsten(VI)|

* H3PW12O40
* (NH4)10(H2W12O42)
* WO2Cl2
* WCl6
* WF6
* WN2
* WO3
* WS3
* WOBr4
* WOCl4
* WOF4
* H2WO4

| Organotungsten(VI) compounds|

* W(CH3)6

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Template:Silicides

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