Thin Solid Films

Thin Solid Films  

|Subject |Discipline}}	Thin-film synthesis, applied physics
Language	English
Edited by	J. E. Greene
Publication details
Former name(s)	Symposium on Plasma Science for Materials
History	1967–present
Publisher	Elsevier
Frequency	Biweekly
Impact factor	2.183 (2020)
Standard abbreviations ISO 4 (alt) · Bluebook (alt1 · alt2) NLM (alt) · MathSciNet (alt )
ISO 4	Thin Solid Films
Indexing CODEN · JSTOR (alt) · LCCN (alt) MIAR · NLM (alt) · Scopus
CODEN	THSFAP
ISSN	0040-6090
LCCN	81005059
OCLC no.	1605925
Links
Journal homepage Online access

Thin Solid Films is a peer-reviewed scientific journal published 24 times per year by Elsevier. It was established in July 1967. The current editor-in-chief is J. E. Greene (University of Illinois at Urbana–Champaign).

Aims and scope

The journal covers research on thin-film synthesis, characterization, and applications, including synthesis, surfaces, interfaces, colloidal behavior, metallurgical topics, mechanics (including nanomechanics), electronics, optics, optoelectronics, magnetics, magneto-optics, and superconductivity.

Abstracting and indexing

The journal is indexed and abstracted in:

• Cambridge Scientific Abstracts
• Chemical Abstracts
• Chemical Abstracts Service
• Current Contents/Engineering, Computing & Technology
• Current Contents/Physical, Chemical & Earth Sciences
• Engineering Index
• Inspec
• Metals Abstracts
• PASCAL
• Physikalische Berichte
• Science Citation Index
• Scopus

According to the Journal Citation Reports, the journal has a 2020 impact factor of 2.183.^[1]

References

External links

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